Facilities
The Lai group is equipped with various facilities necessary for the development of III-nitride optoelectronic devices. These facilities, ranging from growth, fabrication, and characterization, are either installed in Lai’s lab, shared by other collaborating groups, or supported by the Optical Sciences Center at NCU. Below are some of the major tools:
Annealing Furnace
(Temperature range: RT ~ 1200 °C)
Probe station with IPCE
(Incident Photon to Current Efficiency)System (Excitation wavelength: 300 ~ 1100 nm)
Metal-Organic Chemical Vapor Deposition
(MOCVD, AIXTRON 200/4 RF)
Bio-molecular Optical Microscopy
(supported by Prof. Chien, Fan-Ching in DOP at NCU )
Photoluminescence System
(Excitation sources: 193-nm KrF excimer laser, 325-nm He-Cd laser, 405-nm diode laser)